TERA-print®

A NEW AND POWERFUL WAY TO NANOFABRICATE
 
The first and only company to unlock the potential of beam pen lithography (BPL), bringing a new and unique blend of capabilities to the world of nanofabrication.
 
 
 
 
 

A unique blend of technical capabilities

 

Resolution

Create a range of feature sizes, from 250 nm resolution or > 100 µm.

Change patterning resolutions from 250 nm to over 100 µm in an instant.

Versatility

Pattern any material in any arrangement you want, with ease.

Enhanced material compatibility enables limitless patterning flexibility.

Throughput

10,000s of active probes working in parallel, yet controlled independently.

Pattern with independent control over tens of thousands of active probes.

 

 One instrument, limitless possibilities.

 
 
 
 
 

Meet E series 2.0

The first commercial beam pen lithography (BPL) tool.

 
 
 
 
 

Featured TERA-Fab® Applications

 
 
 

Featured Publications