Beam pen lithography (BPL) uses a specialized, massively parallel array of apertured probes with a highly advanced digital light processing (DLP) module to independently control hundreds of thousands of microbeams of light in parallel.


With BPL, each probe can create an individual micropattern or all probes in the array can work in concert to stitch larger mm² scale designs in a seamless manner.


The resolution of BPL is defined by probe aperture size. By making the apertures small enough, sub-diffraction limit (<250 nm) resolution can be achieved.


Not only is BPL wavelength agnostic, but also operates in an ambient environment (does not require a vacuum). As such, BPL can be used for patterning a broad spectrum of soft and hard materials.