TERA-Fab® E series 2.0
High-resolution maskless photolithography.
Key Features
Precise Multiwavelength Optics
Powered by an advanced light engine, the E series delivers high powered light with unparalleled uniformity across the projection area at the wavelength you need. Customize your E series by choosing from a range of LED options that span from UV to visible wavelengths.
Sub-Diffraction Limit to Micro Scale Resolution
Create patterns and structures with sub-diffraction resolution (<250 nm) by operating the E series in the beam pen lithography mode. Alternatively, access microscale resolution patterning (>1.25 µm) by using E series as a maskless photolithography tool without a beam pen array.
An Intelligent Digital Photomask Platform
Take advantage of our maskless pattern design platform and gain the ability to conduct truly arbitrary nano-and-micropatterning over mm2 to cm2 areas. By simply uploading an image (PNG, JPG, BMP), users can change their pattern design on the fly.
Efficient Automated Alignment
The E series features a fast and automated alignment function that enables repeatable and highly uniform patterned surfaces from one experiment to the next.
Control With Simplicity
Simple and intuitive hardware and software design allows users of any background to nanofabricate with E series after only a few hours of training. The eOS software provides full control over key patterning parameters that can be tailored for any application.
Team TERA, At Your Service
We take pride in our ability to serve our global user base with both on-site and virtual support. Team TERA is actively engaging with customers to ensure the best possible user experience.
